We use cookies for the proper functioning of the site. By working with our site, you give your consent to our use of cookies

OPTEC Gathered More Than 50 Users of Raith Equipment’s at the Annual Meeting in Moscow

On June 9, 2017, a traditional meeting of Raith equipment’s users was held in Moscow: «E-Beam Lithography with Raith Equipment: From Idea to Realization." This year, it was held at the premises of the Scientific and Educational Center Functional Micro/Nanosystems of Bauman Moscow State Technical University, which is equipped with 50 kV installation of electron beam lithography Raith VOYAGER.

More than 50 specialists from universities, institutes, research centers, and knowledge-intensive industries from Moscow, St. Petersburg, Tomsk, Veliky Novgorod, and Nizhny Novgorod took part in the 6th meeting of Raith equipment’s users. Representatives of Raith GmbH, Germany, Martin Kirchner and Martin Rasche and Jeanine Wilbers from Raith B.v. , Netherlands, took part in the event as well and made reports on the latest developments in the field of e-beam lithography.

The workshop was opened by Rinat Galiev, senior fellow, Federal Publicly Funded Institution of Science The Institute of Super-High Frequency Semiconductors Electronics of the Russian Academy of Sciences; Ilya Rodionov, Director, Scientific and Educational Center Functional Micro/Nanosystems; and Kirill Atlasov, expert, Department of Scientific and Industrial Materials Science at OPTEC. Raith VOYAGER systems were installed at the Institute of Super-high Frequency Semiconductors Electronics of the Russian Academy of Sciences and at the Scientific and Educational Center Functional Micro/Nanosystems in 2013 and 2015, respectively. They are the basic instruments of these centers in the development of new microwave electronic devices, as well as the element base on new physical principles, nanophotonics and optics, bioanalytical platforms such as «laboratory on a chip», recuperation systems based on MEMS, and thin-film technologies.

Reports on the results of work and new perspectives in the field of e-beam lithography were made by researchers from Lomonosov Moscow State University, National Nuclear Research National University MEPHI, and the Institute of Radioengineering and Electronics named after v. A. Kotelnikov. Jeanine Wilbers, a research associate from Raith B.v. , Netherlands, made a report on the latest news and improvements of installing of e-beam lithography series Raith EBPG 5150/5200.

Within the framework of the practical session, the participants discussed current technical problems from the practice in the application of e-beam lithography. At the end of the event, a guided tour to the «clean rooms» of the Scientific and Educational Center Functional Micro/Nanosystems was held.